International Journal of Electronics and Microcircuits
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P-ISSN: 2708-4493, E-ISSN: 2708-4507

2022, Vol. 2, Issue 1, Part A


On optimization of manufacturing of a transconductance operational amplifiers to increase integration rate of elements


Author(s): EL Pankratov

Abstract: In this paper we introduce an approach to increase integration rate of elements of a transconductance operational amplifiers. In the framework of the approach we consider a heterostructure with special configuration. Several specific areas of the heterostructure should be doped by diffusion or ion implantation. Annealing of dopant and/or radiation defects should be optimized.

Pages: 30-50 | Views: 440 | Downloads: 182

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How to cite this article:
EL Pankratov. On optimization of manufacturing of a transconductance operational amplifiers to increase integration rate of elements. Int J Electron Microcircuits 2022;2(1):30-50.
International Journal of Electronics and Microcircuits
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