International Journal of Electronics and Microcircuits
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P-ISSN: 2708-4493, E-ISSN: 2708-4507

2021, Vol. 1, Issue 2, Part A


On influence of mismatch-induced stress and porosity of materials on manufacturing of a current reference generator


Author(s): EL Pankratov

Abstract: In this paper we introduce an approach to increase density of field-effect transistors in the framework of a current reference generator. Framework the approach we consider manufacturing the inverter in heterostructure with specific configuration. Several required areas of the heterostructure should be doped by diffusion or ion implantation. After that dopant and radiation defects should by annealed framework optimized scheme. We also consider an approach to decrease value of mismatch-induced stress in the considered heterostructure. We introduce an analytical approach to analyze mass and heat transport in heterostructures during manufacturing of integrated circuits with account mismatch-induced stress.

Pages: 34-53 | Views: 426 | Downloads: 113

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International Journal of Electronics and Microcircuits
How to cite this article:
EL Pankratov. On influence of mismatch-induced stress and porosity of materials on manufacturing of a current reference generator. Int J Electron Microcircuits 2021;1(2):34-53.
International Journal of Electronics and Microcircuits
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