Red Paper
International Journal of Electronics and Microcircuits
  • Printed Journal
  • Refereed Journal
  • Peer Reviewed Journal

P-ISSN: 2708-4493, E-ISSN: 2708-4507
Peer Reviewed Journal

2025, Vol. 5, Issue 2, Part A


Fabrication techniques for high-speed microcircuits in modern electronics


Author(s): Haruki Tanabe and Aiko Nakamura

Abstract: The rapid advancement of modern electronics has driven the demand for high-speed microcircuits capable of operating reliably at multi-gigahertz frequencies. This study investigates and compares four fabrication techniques photolithography with PVD, electron-beam lithography with CVD, laser-assisted direct writing, and a hybrid approach combining ALD with E-beam lithography to evaluate their impact on key performance parameters including bandwidth, insertion loss, and signal propagation delay. High-resistivity silicon, sapphire, GaAs substrates, graphene, GaN, and low-k dielectrics were employed to enhance electrical and thermal properties. Fabricated devices were characterized using SEM, AFM, and vector network analysis to extract high-frequency performance metrics. Statistical analysis through permutation ANOVA confirmed significant differences between fabrication methods, with the hybrid process demonstrating the highest bandwidth (≈27 GHz), lowest insertion loss, and minimal propagation delay. These results emphasize the critical role of nanoscale precision and advanced material integration in minimizing parasitic effects and enhancing signal fidelity. The findings support the hypothesis that advanced fabrication techniques can bridge the gap between research-grade devices and scalable high-performance microcircuit production. Practical recommendations suggest matching fabrication strategies to performance targets, with hybrid and E-beam methods suited for ultra-high-speed applications, laser-assisted fabrication for rapid prototyping, and conventional photolithography for cost-sensitive designs. This research provides a structured framework for selecting fabrication techniques based on performance, scalability, and application requirements, thereby contributing to the development of next-generation high-speed electronic systems.

Pages: 28-32 | Views: 133 | Downloads: 22

Download Full Article: Click Here

International Journal of Electronics and Microcircuits
How to cite this article:
Haruki Tanabe, Aiko Nakamura. Fabrication techniques for high-speed microcircuits in modern electronics. Int J Electron Microcircuits 2025;5(2):28-32.
International Journal of Electronics and Microcircuits

International Journal of Electronics and Microcircuits

International Journal of Electronics and Microcircuits
Call for book chapter