2024, Vol. 4, Issue 2, Part A
Optimization of 5G microcircuit design using ANSYS HFSS and Photolithography: A performance evaluation study
Author(s): Patrick Murphy and Siobhán Doyle
Abstract:
The study titled "Optimization of 5G Microcircuit Design Using ANSYS HFSS and Photolithography: A Performance Evaluation Study" explores the integration of ANSYS HFSS simulation tools and Photolithography fabrication techniques to design and optimize microcircuits for 5G and beyond wireless communication systems. The research addresses the increasing demand for high-frequency, energy-efficient, and low-latency microcircuits capable of operating within the 24–52 GHz mmWave spectrum.
Materials and Methods: The study employed ANSYS HFSS for electromagnetic simulation and performance optimization of critical parameters such as Signal-to-Noise Ratio (SNR), Voltage Standing Wave Ratio (VSWR), and Return Loss (S11). The fabricated microcircuits utilized Rogers RO4350B substrates and Photolithography techniques, achieving sub-10 nm precision and ±0.4 μm alignment accuracy.Results: The optimized microcircuits demonstrated significant improvements, including an SNR of 35.2 dB, VSWR of 1.05, Return Loss of -15.4 dB, and Latency of 1.8 ms. Environmental stability reached 98.5%, showcasing resilience under varying conditions.
Discussion: The integration of simulation and fabrication highlighted the strong alignment between theoretical predictions and real-world performance. The results addressed long-standing challenges in signal integrity, energy efficiency, and environmental resilience, validating the scalability and reproducibility of the adopted methodology.
Conclusion: The study successfully optimized microcircuit designs for 5G wireless systems, demonstrating superior performance across key metrics. This integrated approach provides a reliable and replicable framework for advancing next-generation wireless technologies and lays the groundwork for future innovations in 6G communication systems.
DOI: 10.22271/27084493.2024.v4.i2a.56
Pages: 44-49 | Views: 77 | Downloads: 27
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How to cite this article:
Patrick Murphy, Siobhán Doyle. Optimization of 5G microcircuit design using ANSYS HFSS and Photolithography: A performance evaluation study. Int J Electron Microcircuits 2024;4(2):44-49. DOI: 10.22271/27084493.2024.v4.i2a.56
